| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a grounding pin capable of effectively preventing electrostatic charge when drawing a predetermined pattern by sequentially irradiating a mask with a charged particle beam, the mask being formed by sequentially laminating a light shielding film, resist film and conductive film that are patterned on a substrate and to provide a charged particle beam drawing device capable of changing grounding pins according to drawing subjects in the case that plural grounding pins exist. <P>SOLUTION: A grounding pin 10c<SB POS="POST">2</SB>is provided in contact with a conductive film, in an electron beam drawing device drawing a predetermined pattern by irradiating a mask with an electron beam, the mask being formed by sequentially laminating a light shielding film, resist film and conductive film that are patterned on a glass substrate. A lower end of the grounding pin 10c<SB POS="POST">2</SB>is formed so as to contain a round shape, or while a lower part of the grounding pin is formed so as to have a tapering shape toward the lower end, the lower end of the grounding pin is formed so as to contain the round shape. <P>COPYRIGHT: (C)2012,JPO&INPIT |
