| 摘要 |
A resist on an electronic material is surely separated and removed in a short time. The electronic material is cleaned with a sulfuric acid solution containing persulfuric acid to separate and clean the resist, and thereafter wet cleaning is performed with gas dissolved water. By using gas dissolved water for performing wet cleaning after the resist separation with the sulfuric acid solution containing persulfuric acid, the time required for cleaning can be sharply reduced as compared with that of a former method. The sulfuric acid solution containing persulfuric acid is preferably one produced by electrolyzing a sulfuric acid solution. A sulfuric acid solution which is discharged from a resist separation and cleaning device and in which the persulfuric acid concentration has decreased is supplied to an electrolytic reactor for regeneration, and then the sulfuric acid solution, in which the persulfuric acid concentration has been sufficiently increased, is circulated to the cleaning device, whereby the resist can be efficiently separated and removed with the high-concentration persulfuric acid and the repeated use of the sulfuric acid can be achieved. |
