METHOD FOR RINSING AND/OR DRYING AN ECPR CHAMBER, AND CHUCKS AND CHUCK ASSEMBLIES THEREFORE

摘要

A chuck for holding a substrate or master electrode in an ECPR process is provided. The chuck comprises an interaction surface (101) for a master electrode or a substrate; and holding means for holding the substrate or master electrode on said interaction surface (101). A chuck surface (102) is positioned circumferentially of the interaction surface (101), and at least one drying or rinsing inlet (103) and at least one drying or rinsing outlet (104) on said chuck surface, said at least one drying or rinsing inlet (103) and the at least one drying or rinsing outlet (104) are positioned on opposing sides of the interaction surface (101) in relation to each other. Assemblies and methods thereof are also provided.