| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polymer which is included in a resist composition having an excellent mask error factor (MEF) and CD uniformity (CDU), and forming a pattern with few defects. <P>SOLUTION: The polymer includes a group represented by formula (I) and a group represented by formula (II), [wherein in formula (I), R<SP POS="POST">1</SP>is a 1C-6C fluorinated alkyl group. * is a coupling, in formula (II), R<SP POS="POST">2</SP>is a 1C-6C fluorinated alkyl group, R<SP POS="POST">3</SP>is a 1C-6C fluorinated alkyl group, R<SP POS="POST">4</SP>is a 1C-12C acyl group or a group unstable against to an acid. * is a coupling]. <P>COPYRIGHT: (C)2012,JPO&INPIT |
