发明名称 STORAGE DEVICE AND STORAGE DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a storage device which can reduce an amount of a sediment generated in the course of processing an upper antiferromagnetic layer. <P>SOLUTION: The storage device comprises a storage element 10 for storing information by flowing a current in a lamination direction of layers and wires for supplying the storage element 10 with a current flowing in the lamination direction of the layers of the storage element 10. The storage element 10 includes a first magnetization fix layer 13 provided at a lower layer via a tunnel insulation layer 14 with respect to a storage layer 15, a second magnetization fix layer 17 provided at an upper layer via a tunnel insulation layer 16, a first antiferromagnetic layer 12 for fixing a magnetization direction of the first magnetization fix layer 13, and a second antiferromagnetic layer 18 having a thickness thinner than that of the first antiferromagnetic layer 12 for fixing a magnetization direction of the second magnetization fix layer 17. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012015212(A) 申请公布日期 2012.01.19
申请号 JP20100148218 申请日期 2010.06.29
申请人 SONY CORP 发明人 UCHIDA HIROYUKI;HOSOMI MASAKATSU;OMORI HIROYUKI;BESSHO KAZUHIRO;HIGO YUTAKA;YAMANE ICHIYO
分类号 H01L27/105;H01L21/8246;H01L43/08;H01L43/12 主分类号 H01L27/105
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