发明名称 TWO-FLUID NOZZLE, SUBSTRATE PROCESSING APPARATUS, METHOD OF GENERATING LIQUID DROPLET, AND SUBSTRATE PROCESSING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a two-fluid nozzle which can widen the spray range of liquid droplets sprayed to a substrate, and to provide a substrate processing apparatus, a method of generating liquid droplets, and a substrate processing method. <P>SOLUTION: A swirling flow of liquid droplet generation gas discharged downward from a gas discharge opening 46b, and liquid discharged downward from a liquid discharge opening 44b are mixed below the body 42 of a two-fluid nozzle 40 thus generating liquid droplets. Furthermore, a pressure adjustment section which adjusts pressure on the inside of the swirling flow of liquid droplet generation gas discharged downward from the gas discharge opening 46b is provided in the body 42. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012015180(A) 申请公布日期 2012.01.19
申请号 JP20100147848 申请日期 2010.06.29
申请人 TOKYO ELECTRON LTD 发明人 KANEKO SATOSHI;KAI YOSHIHIRO
分类号 H01L21/304;B05B7/06;B05B7/10 主分类号 H01L21/304
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