| 摘要 |
The present invention provides technology directed to a semiconductor device and a method of manufacturing the same. According to the present invention, metal contact plugs are formed to come into contact with both sidewalls of a capacitor, including lower electrodes, dielectric layers, and an upper electrode. Accordingly, contact resistance can be reduced because the contact area of the upper electrode and the metal contact plugs forming the capacitor, can be increased. Furthermore, the number of chips per wafer can be increased because the area in which the metal contact plugs and the capacitor are formed can be reduced. In addition, the generation of noise can be reduced because the contact area of the capacitor and the metal contact plugs is increased and thus voltage at the upper electrode is stabilized. |
