SUBSTRATE HOLDER FOR MOLECULAR BEAM EPITAXY

摘要

PURPOSE: A substrate holder for a molecular beam epitaxy apparatus is provided to reduce unevenness of a thermal expansion coefficient and processing temperature of a substrate, thereby minimizing crack generation within the substrate in a high temperature heating process. CONSTITUTION: A substrate holder(10') is formed into a tube shape which is opened in up and down directions. A protrusion(11) is arranged along the circumference in the inner surface of the substrate holder in order to horizontally mount an epitaxy target substrate(D). A plurality of supporting projections(12) is arranged in the upper surface of the protrusion in order to separate the substrate from the protrusion. A step shape groove is arranged in the inner upper part of the substrate holder. The substrate holder is manufactured with pure molybdenum or molybdenum alloy.