发明名称 NON-VOLATILE MEMORY TRANSISTOR HAVING DOUBLE GATE STRUCTURE
摘要 PURPOSE: A non-volatile memory transistor with a dual gate structure is provided to apply operating voltage by connecting a first gate electrode and a second gate electrode, thereby improving electric field mobility characteristics. CONSTITUTION: A first gate electrode(102) is arranged on a substrate(100). A first gate insulating film(104) is arranged on the first gate electrode. Source and drain electrodes(106) are arranged on the first gate insulating film. A channel film is arranged on the first gate insulating film between the source and drain electrodes. A second gate insulating film(112A) is arranged on the channel film. A second gate electrode(118) is arranged on the second gate insulating film.
申请公布号 KR20120006218(A) 申请公布日期 2012.01.18
申请号 KR20100066837 申请日期 2010.07.12
申请人 ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE 发明人 YOON, SUNG MIN;YANG, SHIN HYUK;BYUN, CHUN WON;RYU, MIN KI;JUNG, SOON WON
分类号 H01L27/115;H01L21/8247 主分类号 H01L27/115
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