SILICON-BASED HARDMASK COMPOSITION (SI-SOH; SI-BASED SPIN-ON HARDMASK) AND PROCESS OF PRODUCING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE USING THE SAME
摘要
<p>A silicon-based hardmask composition, including an organosilane polymer represented by Formula 1: {(SiO1.5-Y-SiO1.5)x(R3SiO1.5)y(XSiO1.5)z}(OH)e(OR6)f(1).</p>
申请公布号
EP2229607(A4)
申请公布日期
2012.01.18
申请号
EP20080869469
申请日期
2008.12.31
申请人
CHEIL INDUSTRIES INC.
发明人
KIM, SANG KYUN;CHO, HYEON MO;KOH, SANG RAN;KIM, MI YOUNG;YUN, HUI CHAN;CHUNG, YONG JIN;KIM, JONG SEOB
