发明名称 A METHOD OF FABRICATING A MULTILAYER STRUCTURE WITH CIRCUIT LAYER TRANSFER
摘要 <p>A method of producing a composite structure comprises a step of producing a first layer of microcomponents on one face of a first substrate, the first substrate being held flush against a holding surface of a first support during production of the microcomponents, and a step of bonding the face of the first substrate comprising the layer of microcomponents onto a second substrate. During the bonding step, the first substrate is held flush against a second support, the holding surface of which has a flatness that is less than or equal to that of the first support used during production of the first layer of microcomponents.</p>
申请公布号 EP2406820(A1) 申请公布日期 2012.01.18
申请号 EP20100706264 申请日期 2010.03.04
申请人 S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES 发明人 CASTEX, ARNAUD;BROEKAART, MARCEL
分类号 H01L21/762 主分类号 H01L21/762
代理机构 代理人
主权项
地址