发明名称 |
Exposure apparatus and method for photolithography process |
摘要 |
Provided is an exposure apparatus including a variable focusing device. The variable focusing device may include a transparent membrane that may be deformed in the presence of an electric field. The deformation of the transparent membrane may allow the focus length of a radiation beam to be modified. In an embodiment, the variable focusing device may be modulated such that a radiation beam having a first focus length is provided for a first position on an exposure target and a radiation beam having a second focus length is provided for a second position on the exposure target. A method and computer-readable medium are also provided. |
申请公布号 |
US8098364(B2) |
申请公布日期 |
2012.01.17 |
申请号 |
US20070875471 |
申请日期 |
2007.10.19 |
申请人 |
YU VINVENT;WANG HSIEN-CHENG;HSIEH HUNG-CHANG;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
YU VINVENT;WANG HSIEN-CHENG;HSIEH HUNG-CHANG |
分类号 |
G02F1/29;G03B27/32;G03B27/42;G03B27/52;G03B27/54;G03B27/72 |
主分类号 |
G02F1/29 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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