发明名称 |
Method and system for evaluating an evaluated pattern of a mask |
摘要 |
A method, system and a computer program product for evaluating an evaluated pattern of a mask, the method includes: receiving multiple moments that represent an image of the evaluated pattern; wherein a size of information required for representing the multiple moments is substantially smaller than a size of pixel information that form the image of the evaluated pattern; and processing the multiple moments in order to determine at least one shape parameter of the evaluated pattern. |
申请公布号 |
US8098926(B2) |
申请公布日期 |
2012.01.17 |
申请号 |
US20080971209 |
申请日期 |
2008.01.08 |
申请人 |
SCHWARZBAND ISHAI;MANGAN SHMOOLIK;BRAUDE CHAIM;BEN-YISHAI MICHAEL;GREENBERG GADI;APPLIED MATERIALS ISRAEL, LTD. |
发明人 |
SCHWARZBAND ISHAI;MANGAN SHMOOLIK;BRAUDE CHAIM;BEN-YISHAI MICHAEL;GREENBERG GADI |
分类号 |
G06K9/00 |
主分类号 |
G06K9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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