| 摘要 |
PURPOSE: A mask blank, a multi-gray scale mask, and a method for manufacturing the same are provided to implement manufacturing processes by omitting a thin film forming process in the middle of a mask manufacturing process. CONSTITUTION: A mask blank is a laminated structure and is composed of a transmittance substrate(1), a transmittance part, a first semi-transmittance part, a second semi-transmittance part, and a light shielding part(30). The first semi-transmittance part is includes one or more elements selected from tantalum, hafnium, and zirconium. The second semi-transmittance part is a silicide-based semi-transmittance film based on a material containing a metal and silicon. A multi-gray scale mask is manufactured using the mask blank. The multi-gray scale mask includes a transferring pattern. |
