| 摘要 |
PURPOSE: A device and method for physical vapor deposition for gradation are provided to improve gradation effect of a target by varying the width and thickness of the target. CONSTITUTION: A method for physical vapor deposition for gradation comprises next steps. The deposition is performed when a mask is arranged between a target and a workpiece(S910,S920). The depositions are performed again after the location of the mask is converted(S930,S940). A workpiece is transferred to a specified direction. The location shift of the mask is performed within the deposition range of the workpiece which deposited at the first stage. The mask is separated from the workpiece over 10mm within the range scale between the workpiece and the target. The second deposition step is repeated over than twice less than twenty times.
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