发明名称 SYSTEM, METHOD AND APPARATUS FOR LASER PRODUCED PLASMA EXTREME ULTRAVIOLET CHAMBER WITH HOT WALLS AND COLD COLLECTOR MIRROR
摘要 An extreme ultraviolet light system and method includes a drive laser, a chamber including an extreme ultraviolet light collector and a target material dispenser including an adjustable target material outlet capable of outputting multiple portions of target material along a target material path. Also included: a drive laser steering device, a detection system including at least one detector and a controller coupled to the target material dispenser, the detector system and the drive laser steering device. The controller includes logic for detecting a location of the first portion of target material from the first light reflected from the first portion of target material and logic for adjusting the target material dispenser outlet to output a subsequent portion of target material to a waist of the focused drive laser. A system and a method for optimizing an extreme ultraviolet light output is also disclosed.
申请公布号 KR20120005501(A) 申请公布日期 2012.01.16
申请号 KR20117026585 申请日期 2010.03.31
申请人 CYMER, INC. 发明人 PARTLO WILLIAM N.;FOMENKOV IGOR V.
分类号 H05G2/00;G01J1/42;H01L21/027 主分类号 H05G2/00
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