SUBSTRATE CLEANING METHOD AND SUBSTRATE CLEANING DEVICE

摘要

PURPOSE: A substrate cleaning method and apparatus are provided to form a stable boundary between a liquid layer of rinse liquid and a dry region by establishing a speed of rotation of a substrate at the peripheral part of the substrate lower than a speed of rotation of the substrate at the central part of the substrate. CONSTITUTION: A developer nozzle(421) is connected to a developer providing source(G1) through a developing solution supply pipe(431). A valve(V1) is installed in the developing solution supply pipe. A liquid nozzle(453a) of a gas-liquid supply nozzle(453) is connected to a rinse fluid supply source(G2) through a rinse fluid supply pipe(461). A valve(V2) is installed in the rinse fluid supply pipe. A gas nozzle(453b) of the gas-liquid supply nozzle is connected to an inert gas supply source(G3) through an inert gas supply pipe(471). A valve(V3) is installed in the inert gas supply pipe.