发明名称 |
SEMICONDUCTOR STACKED STRUCTURE AND ULTRAVIOLET SENSOR |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a semiconductor stacked structure capable of forming a light receiving layer of group III nitride with excellent crystallinity, and to provide an ultraviolet sensor using the structure. <P>SOLUTION: A semiconductor stacked structure 1 is composed such that a group III nitride underlying layer 4 and a group III nitride layer 5 containing at least Ga are sequentially stacked on a predetermined substrate 3, and then an AlyInxGa1-x-yN light receiving layer 6 composed of group III nitride containing In and Al, or at least one of them is provided on the stack. An ultraviolet sensor 2 is manufactured such that a Schottky electrode 7s and an ohmic electrode 7o are formed on the surface of the semiconductor stacked structure. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012009718(A) |
申请公布日期 |
2012.01.12 |
申请号 |
JP20100145757 |
申请日期 |
2010.06.28 |
申请人 |
NAGOYA INSTITUTE OF TECHNOLOGY |
发明人 |
EGAWA TAKASHI;SAKAI YUSUKE;FUJITA KAZUHISA |
分类号 |
H01L31/108;C23C14/14;C23C16/34;H01L21/205 |
主分类号 |
H01L31/108 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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