| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a susceptor that maintains stable plasma and deposits a uniform film by improving design of a susceptor for a plasma processing device. <P>SOLUTION: A vacuum chamber for a plasma processing device includes a main body 100, a shower head 125 provided to a ceiling of the main body, a base 140 provided in a chamber body, and a susceptor 135 coupled to the base. The susceptor has a graphite main body, which has an upper surface for supporting at least one substrate. The upper surface has a coating of a dielectric such as an aluminum oxide coating formed by, for example, plasma spraying. <P>COPYRIGHT: (C)2012,JPO&INPIT |
