发明名称 System for In-Situ Mixing and Diluting Fluorine Gas
摘要 [Task] It is a task to provide a fluorine gas supply system which can stably supply fluorine gas generated by a fluorine gas generation device to a semiconductor processing device in a large quantity and in a precise concentration. [Means for solving task] In the fluorine gas supply system, a mixed gas stored in a buffer tank is introduced into a gas introducing piping before the mixed gas is adjusted in the buffer tank to circulate the mixed gas and a monitoring device is disposed which measures a fluorine gas concentration within the mixed gas so that, in response to the obtained fluorine gas concentration, a flow quantity of inert gas supply source can be adjusted.
申请公布号 US2012006487(A1) 申请公布日期 2012.01.12
申请号 US201013256842 申请日期 2010.02.26
申请人 KIKUCHI AKIOU;MORI ISAMU;YAO AKIFUMI;MIYAZAKI TATSUO;NAKAHARA KEITA;CENTRAL GLASS COMPANY, LIMITED 发明人 KIKUCHI AKIOU;MORI ISAMU;YAO AKIFUMI;MIYAZAKI TATSUO;NAKAHARA KEITA
分类号 H01L21/306 主分类号 H01L21/306
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