发明名称 |
System for In-Situ Mixing and Diluting Fluorine Gas |
摘要 |
[Task] It is a task to provide a fluorine gas supply system which can stably supply fluorine gas generated by a fluorine gas generation device to a semiconductor processing device in a large quantity and in a precise concentration. [Means for solving task] In the fluorine gas supply system, a mixed gas stored in a buffer tank is introduced into a gas introducing piping before the mixed gas is adjusted in the buffer tank to circulate the mixed gas and a monitoring device is disposed which measures a fluorine gas concentration within the mixed gas so that, in response to the obtained fluorine gas concentration, a flow quantity of inert gas supply source can be adjusted. |
申请公布号 |
US2012006487(A1) |
申请公布日期 |
2012.01.12 |
申请号 |
US201013256842 |
申请日期 |
2010.02.26 |
申请人 |
KIKUCHI AKIOU;MORI ISAMU;YAO AKIFUMI;MIYAZAKI TATSUO;NAKAHARA KEITA;CENTRAL GLASS COMPANY, LIMITED |
发明人 |
KIKUCHI AKIOU;MORI ISAMU;YAO AKIFUMI;MIYAZAKI TATSUO;NAKAHARA KEITA |
分类号 |
H01L21/306 |
主分类号 |
H01L21/306 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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