发明名称 MOCVD SYSTEM HAVING MULTIPLE EPITAXIAL REACTOR CHAMBERS AND OPERATION METHOD THEREOF
摘要 <p>A MOCVD system having multiple epitaxial reactor chambers and an operation method thereof. The system is for use in conducting an epitaxial reaction on several substrates placed on a tray, and comprises a conveyance chamber provided with a mechanical arm, several transfer stations connected to the conveyance chamber, and two or more epitaxial reactor chambers. The epitaxial reactor chambers can conduct simultaneously an epitaxial reaction on the substrates.</p>
申请公布号 WO2012003715(A1) 申请公布日期 2012.01.12
申请号 WO2011CN01124 申请日期 2011.07.08
申请人 JIANGSU ZHONGSHENG SEMICONDUCTOR EQUIPMENT CO., LTD;CHEN, AIHUA;JIN, XIAOLIANG;SUN, RENJUN;ZHANG, WEI 发明人 CHEN, AIHUA;JIN, XIAOLIANG;SUN, RENJUN;ZHANG, WEI
分类号 C23C16/44;C30B25/02;H01L21/205 主分类号 C23C16/44
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