发明名称 EXPOSURE DEVICE AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide an exposure device capable of preventing the expansion of damage due to an outflow of liquid, and finely performing exposure processing and measurement processing. <P>SOLUTION: The exposure device (EX) comprises a table (PT) capable of moving, a base member (41) having an upper surface (41A) guiding the movement of the table (PT), and a detection device (60) detecting wether liquid (LQ) exists on the upper surface (41A) of the base member (41) or not. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012009897(A) 申请公布日期 2012.01.12
申请号 JP20110209554 申请日期 2011.09.26
申请人 NIKON CORP 发明人 SHIBUTA SHIN
分类号 H01L21/027;G03F7/20;H01L21/68 主分类号 H01L21/027
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