发明名称 APPARATUS FOR REAL-TIME INSPECTION OF DIGITAL LITHOGRAPHIC PATTERN AND METHOD THEREOF
摘要 PURPOSE: An apparatus for inspecting a digital lithographic pattern in real time and a method thereof are provided to improve whole productivity by detecting deformity from a digital lithographic pattern without a photolithography process. CONSTITUTION: A light modulator(20) includes a plurality of digital micro-mirror devices(21,23). An image input part(70) successively receives a plurality of exposure pattern images from a light modulator. An error detector(80) detects deformity from an accumulated exposure pattern image. A projection optical part(60) is placed between the light modulator and the image input part. A controller(30) controls a plurality of digital micro mirror devices based on exposure data.
申请公布号 KR20120004158(A) 申请公布日期 2012.01.12
申请号 KR20100064871 申请日期 2010.07.06
申请人 EO TECHNICS CO., LTD. 发明人 HUR, JUN GYU;CHOI, JAE MAN
分类号 H01L21/027;G03F7/20;H01L21/66 主分类号 H01L21/027
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