发明名称 |
APPARATUS FOR REAL-TIME INSPECTION OF DIGITAL LITHOGRAPHIC PATTERN AND METHOD THEREOF |
摘要 |
PURPOSE: An apparatus for inspecting a digital lithographic pattern in real time and a method thereof are provided to improve whole productivity by detecting deformity from a digital lithographic pattern without a photolithography process. CONSTITUTION: A light modulator(20) includes a plurality of digital micro-mirror devices(21,23). An image input part(70) successively receives a plurality of exposure pattern images from a light modulator. An error detector(80) detects deformity from an accumulated exposure pattern image. A projection optical part(60) is placed between the light modulator and the image input part. A controller(30) controls a plurality of digital micro mirror devices based on exposure data.
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申请公布号 |
KR20120004158(A) |
申请公布日期 |
2012.01.12 |
申请号 |
KR20100064871 |
申请日期 |
2010.07.06 |
申请人 |
EO TECHNICS CO., LTD. |
发明人 |
HUR, JUN GYU;CHOI, JAE MAN |
分类号 |
H01L21/027;G03F7/20;H01L21/66 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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