| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a cooling system that reduces heat transfer of an electromagnetic actuator of a lithography device without interfering with operations of other parts. <P>SOLUTION: The lithography device includes an illumination system configured to adjust a radiant beam, a support portion configured to support a patterning device capable of forming a pattern-imparted radiant beam by imparting a pattern to a section of the radiant beam, a substrate table configured to support a substrate, a projection system configured to project the pattern-imparted radiant beam on a target part of the substrate, and a cooling system which cools a part of the lithography device using increased cooling performance to reduce heat transfer from the part to other parts of the lithography device. <P>COPYRIGHT: (C)2012,JPO&INPIT |
