| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition capable of obtaining a resist pattern having excellent resolution and line-edge roughness. <P>SOLUTION: A resist composition comprising: a resin containing a structural unit derived from a monomer represented by formula, (a1-1); an acid generator; and a salt represented by formula (I). In the formulae, L<SP POS="POST">a1</SP>represents -O- or -O-(CH<SB POS="POST">2</SB>)<SB POS="POST">k1</SB>-CO-O-. R<SP POS="POST">a4</SP>represents a hydrogen atom or a methyl group. R<SP POS="POST">a6</SP>represents an aliphatic hydrocarbon group with 1 to 8 carbon atoms or a saturated cyclic hydrocarbon group with 3 to 10 carbon atoms. W<SP POS="POST">1</SP>represents an aromatic heterocycle with 2 to 13 carbon atoms having nitrogen atom(s) or a cyclic aromatic hydrocarbon with 6 to 14 carbon atoms having a -NR<SP POS="POST">1</SP>R<SP POS="POST">2</SP>group as a substituent group. Z<SB POS="POST">1</SB><SP POS="POST">+</SP>represents an organic counter cation. <P>COPYRIGHT: (C)2012,JPO&INPIT |
