METHOD FOR MANUFACTURING A POLYCRYSTALLINE SILICON THIN FILM

摘要

A method for manufacturing a polycrystalline silicon thin film comprises the steps of: forming a metal layer on an insulation substrate; heat-treating the metal layer to form a metal oxide film on the metal layer; stacking an amorphous silicon layer on the metal oxide film; and heat-treating the amorphous silicon layer using the metal layer or metal particles of the oxide film as a catalyst to generate crystalline silicon.