| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition capable of forming a pattern with a wide exposure margin and a low mask error factor and obtaining a pattern with excellent resolution and line edge roughness. <P>SOLUTION: A resist composition comprises: a resin which has an acid labile group, and is insoluble or hardly soluble in an alkali aqueous solution and can dissolve in an alkali aqueous solution by an action of an acid; an acid generator; and at least one kind selected from the group of a compound represented by formula(X) and a compound represented by formula(Y). (In the formulas, R<SP POS="POST">x1</SP>represents a hydrogen atom, a fluorine atom, a saturated cyclic hydrocarbon group or the like; X<SP POS="POST">x1</SP>represents a single bond or an alkanediyl group or the like; X<SP POS="POST">x2</SP>represents -O-, -S- or the like; R<SP POS="POST">x2</SP>, R<SP POS="POST">x3</SP>and R<SP POS="POST">x4</SP>each independently represent a hydrogen atom, an alkyl group or an aromatic hydrocarbon group or the like.) <P>COPYRIGHT: (C)2012,JPO&INPIT |
