| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition which provides a wide focus margin in pattern formation and a resist pattern excellent in line edge roughness. <P>SOLUTION: A resist composition comprises: a resin which has an acid labile group, and is insoluble or slightly soluble in an alkali aqueous solution but is capable of dissolving in an alkali aqueous solution by an action of an acid; an acid generator which is represented by formula(B1); and a compound which is represented by formula(I). (In the formulas, a ring W<SP POS="POST">2</SP>represents a lactone ring; L<SP POS="POST">1</SP>represents a bivalent saturated hydrocarbon group; a ring W<SP POS="POST">1</SP>represents a heterocyclic ring; Q<SP POS="POST">1</SP>and Q<SP POS="POST">2</SP>each independently represent a fluorine atom or a perfluoroalkyl group; L<SP POS="POST">b1</SP>represents a single bond or a bivalent saturated hydrocarbon group; Y represents an aliphatic hydrocarbon group or a saturated cyclic hydrocarbon group which may have a substituent; Z<SP POS="POST">+</SP>represents an organic cation.) <P>COPYRIGHT: (C)2012,JPO&INPIT |
