发明名称 MANUFACTURING METHOD OF SURFACE ACOUSTIC WAVE RESONATOR
摘要 <P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a surface acoustic wave resonator excellent in various characteristics (specifically in Q value). <P>SOLUTION: A surface acoustic wave resonator 1 is of a type of a device known as a 1 port type and comprises: a piezoelectric substrate 2; an IDT (comb-teeth electrode) 3 provided on the piezoelectric substrate 2; and a pair of reflectors 4 and 5 provided at both sides of the IDT 3. The IDT 3 has a plurality of electrode fingers 31a and 31b, and a second groove 25 is formed between the electrode fingers 31a and 31b of the piezoelectric substrate 2. On the other hand, the reflectors 4 and 5 have a plurality of conductor strips 41 and 51, and a first groove 26 which is deeper than the second groove 25 is formed between the conductor strips 41 and 51 of the piezoelectric substrate 2. The first groove 26 and the second groove 25 whose depth are different from each other are formed by utilizing a difference of their detachability to stripping liquid using a resist layer comprised of 2 kinds of resist materials with each having a different characteristic. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012009946(A) 申请公布日期 2012.01.12
申请号 JP20100141817 申请日期 2010.06.22
申请人 SEIKO EPSON CORP 发明人 YAMANAKA KUNIHITO
分类号 H03H3/08;H01L41/09;H01L41/18;H01L41/22;H01L41/332;H03H9/145;H03H9/25 主分类号 H03H3/08
代理机构 代理人
主权项
地址