| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure method capable of exposing a base plate preferably. <P>SOLUTION: A liquid immersion region (LR) is formed on a measurement component (65) using a liquid immersion mechanism (1). Measurement light is received via liquid (LQ), which forms the liquid immersion region (LR), to carry out a measurement to determine an exposure condition of a base plate (P). A base plate (P) is exposed taking a pressure difference for the liquid (LQ) between at times of measuring and exposing as well as the measuring result into account. <P>COPYRIGHT: (C)2012,JPO&INPIT |
