AROMATIC RING-CONTAINING COMPOUND FOR RESIST UNDERLAYER, RESIST UNDERLAYER COMPOSITION INCLUDING SAME, AND METHOD OF PATTERNING DEVICE USING SAME

摘要

PURPOSE: An aromatic ring-containing compound for a resist under-layer, a resist under-layer composition including the same, and a pattern forming method for a device using the same are provided to improve the optical characteristic, the mechanical characteristic, and the etching selectivity of the compound. CONSTITUTION: An aromatic ring-containing compound includes repeating units represented by chemical formulas 1-1 and 1-2. In the chemical formula 1-1, the m is more than or equal to 1 and is less than 190. The p is 1 or 2. The Ar is an aromatic ring. The X is hydroxyl group, substituted or non-substituted C1-C10 alkoxy group, or substituted or non-substituted C6-C30 aryloxy group. The Ra is hydrogen, substituted or non-substituted C1-C10 alkyl group, substituted or non-substituted C3-C8 cycloalkyl group, substituted or non-substituted C6-C30 aryl group, substituted or non-substituted C2-C10 alkenyl group, or halogen. In the chemical formula 1-2, the n is more than or equal to 1 and is less than 190. The Ra and the Rc are identical or different and are hydrogen, substituted or non-substituted C3-C8 cycloalkyl group, or substituted or non-substituted C6-C30 aryl group.