发明名称 SALT, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING RESIST PATTERN
摘要 <P>PROBLEM TO BE SOLVED: To form a pattern having more excellent resolution and focus margin (DOF). <P>SOLUTION: This salt is represented by formula (I). [In the formula, Q<SP POS="POST">1</SP>and Q<SP POS="POST">2</SP>mutually independently represent a fluorine atom or a 1-6C perfluoroalkyl group; L<SP POS="POST">1</SP>represents *-CO-O-L<SP POS="POST">a</SP>- or *-CH<SB POS="POST">2</SB>-O-L<SP POS="POST">b</SP>-, * represents a bond with -C(Q<SP POS="POST">1</SP>)(Q<SP POS="POST">2</SP>)-, L<SP POS="POST">a</SP>and L<SP POS="POST">b</SP>mutually independently represent a bivalent 1-15C saturated hydrocarbon group, and -CH<SB POS="POST">2</SB>- contained in the bivalent saturated hydrocarbon group may be substituted by -O-, or -CO-; W<SP POS="POST">1</SP>represents 2-36C heterocyclic ring, and -CH<SB POS="POST">2</SB>- contained in the heterocyclic ring may be substituted by -O-; and Z<SP POS="POST">1+</SP>represents an organic counter ion]. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012006908(A) 申请公布日期 2012.01.12
申请号 JP20110001782 申请日期 2011.01.07
申请人 SUMITOMO CHEMICAL CO LTD 发明人 YAMAGUCHI NORIFUMI;ICHIKAWA KOJI
分类号 C07D295/08;C07C25/00;C07C381/12;C07D295/14;C09K3/00;G03F7/004;G03F7/039;H01L21/027 主分类号 C07D295/08
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