| 摘要 |
The invention relates to a process for finally removing sulphur-containing, nitrogen-containing and halogen-containing impurities contained in a synthesis gas, said process including: a) a joint step for hydrolysing COS and HCN contained in the gas and for collecting the halogen-containing compounds, using a TiO2-based catalyst, b) a washing step using a solvent, c) a step for desulphurisation on a collecting or adsorbing mass. The synthesis gas purified in accordance with the process of the invention contains less than 10 ppb by weight, less than 10 ppb by weight of nitrogen-containing impurities and less than 10 ppb by weight of halogen-containing impurities. |
