发明名称 NITRIDE-BASED SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 The present invention provides a nitride-based semiconductor device. The nitride-based semiconductor device includes: a base substrate having a diode structure; an epi-growth film disposed on the base substrate; and an electrode part disposed on the epi-growth film, wherein the diode structure includes: first-type semiconductor layers; and a second-type semiconductor layer which is disposed within the first-type semiconductor layers and has both sides covered by the first-type semiconductor layers.
申请公布号 US2012007049(A1) 申请公布日期 2012.01.12
申请号 US20100917812 申请日期 2010.11.02
申请人 JEON WOO CHUL;PARK KI YEOL;LEE JUNG HEE;PARK YOUNG HWAN;SAMSUNG ELECTRO-MECHANICS CO., LTD. 发明人 JEON WOO CHUL;PARK KI YEOL;LEE JUNG HEE;PARK YOUNG HWAN
分类号 H01L29/778;H01L21/329;H01L21/335;H01L29/15 主分类号 H01L29/778
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