摘要 |
The present invention relates to an acid-modified urethane phenoxy acrylate resin and to method for preparing same, and particularly, to an acid-modified urethane phenoxy acrylate resin obtained by reacting (meth)acryloyloxy alkyl isocyanate or bis(meth)acryloyloxy alkyl isocyanate with a phenol-novolac resin to obtain a compound having a urethane-modified acryl at the side chain, and reacting an acid anhydride with the compound. According to the present invention, properties of resins used in conventional photosensitive compositions, such as flexibility, toughness, extensibility, and the like may be improved, while properties such as thermal resistance, adhesion, chemical resistance, insulating properties, and the like may be maintained, in order to provide a photosensitive resin having well-balanced and favorable physical properties. |
申请人 |
SMC CO., LTD;KIM, DAE YEUN;KIM, NAM SUN;LEE, IL JAE |
发明人 |
KIM, DAE YEUN;KIM, NAM SUN;LEE, IL JAE |