A system and process for processing the substrate in the chamber

摘要

A substrate processing apparatus includes a processing chamber (900), a platform with many holders (902) holding the workpieces (901), many heaters (906) and many deposition apparatuses (904). The processing chamber (900) includes the opening (910) for receiving at least a kind of chemical material and the outlet (903) for exhausting the remainder. The outlet (903) connects with the process pump (943). The holders (902) are used to hold the workpieces (901). Each heater (906) is between two workpieces (901). Each deposition apparatus (904) is between two workpieces (901). Each workpiece (901) is between the heater (906) and the deposition apparatus (904). Each deposition apparatus (904) includes at least two shower plates (908) with holes by which the chemical material can be ejected to the workpieces (901).