| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern forming material which is capable of suppressing the reduction in sensitivity of a photosensitive layer and of forming a high-definition pattern. <P>SOLUTION: The pattern forming material for a pattern forming device having a laser light source of 405 nm has at least a photosensitive layer on a support body, and the photosensitive layer contains a polymerization inhibitor, a binder, a polymerizable compound, and a polymerization initiator. When the photosensitive layer is exposed and developed, such minimum energy of light for use in the exposure that a thickness of a portion to be exposed of the photosensitive layer is not changed by the exposure and development is obtained from a sensitive curve and is 4 to 10 mJ/cm<SP POS="POST">2</SP>. The binder is a copolymer obtained by copolymerization of at least a styrene, and the polymerizable compound contains a specific urethane (meth)acrylic compound and a compound expressed by a structural formula (39). <P>COPYRIGHT: (C)2012,JPO&INPIT |
