发明名称 METHOD FOR MANUFACTURING WAVELENGTH PLATE
摘要 <P>PROBLEM TO BE SOLVED: To manufacture a wavelength plate with good durability and stability and also with high humidity resistance. <P>SOLUTION: A dielectric material is obliquely deposited on a substrate. A birefringence layer 14 including columnar parts 12 in which fine particles of the dielectric material are layered in a column manner and void portions 13 provided between the columnar parts 12 is formed. The birefringence layer 14 is subject to the annealing treatment at a temperature between 100&deg;C and 300&deg;C. An inorganic compound is formed on the birefringence layer 14 which has been subject to the annealing treatment with high density, thereby forming a protection layer 15 with low humidity permeability. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012008363(A) 申请公布日期 2012.01.12
申请号 JP20100144559 申请日期 2010.06.25
申请人 SONY CHEMICAL & INFORMATION DEVICE CORP 发明人 KOIKE NOBUYUKI;YAMADA TAKATOSHI;TAKADA AKIO;SASAKI MASATOSHI
分类号 G02B5/30;B32B9/00;G02F1/13363 主分类号 G02B5/30
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