发明名称 |
Method Of Calibrating A Lithographic Apparatus, Device Manufacturing Method and Associated Data Processing Apparatus and Computer Program Product |
摘要 |
A lithographic apparatus is calibrated by reference to a primary reference substrate. Using an apparatus which need not be the same as the one being calibrated, there is obtained an apparatus-specific fingerprint of the primary reference substrate. Using the same set-up there is then obtained an apparatus-specific fingerprint of a secondary reference substrate. The apparatus-specific fingerprint of the primary reference substrate is subtracted from the apparatus-specific fingerprint of the secondary reference substrate to obtain and store an apparatus-independent fingerprint of the secondary reference substrate. The secondary reference substrate and stored apparatus-independent fingerprint are subsequently used together in place of the primary reference substrate as a reference for the calibration of the lithographic apparatus to be calibrated. Initial set-up for a cluster of lithographic tools can be performed with less use of the costly primary reference substrate, and with less interruption to normal production. The initial set-up can be integrated with on-going monitoring and re-calibration of the apparatuses. |
申请公布号 |
US2012008127(A1) |
申请公布日期 |
2012.01.12 |
申请号 |
US201113169673 |
申请日期 |
2011.06.27 |
申请人 |
TEL WIM TJIBBO;PRIL WOUTER ONNO;THEEUWES THOMAS;PADIY ALEXANDER VIKTOROVYCH;ASML NETHERLANDS B.V. |
发明人 |
TEL WIM TJIBBO;PRIL WOUTER ONNO;THEEUWES THOMAS;PADIY ALEXANDER VIKTOROVYCH |
分类号 |
G03B27/32;G06K9/00 |
主分类号 |
G03B27/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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