| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate treatment method and a substrate treatment apparatus having a simple constitution in which the surface of a substrate is treated with droplets. <P>SOLUTION: A jig 10 capable of jetting gas from an opening formed along a circular virtual line and a pressure sensor for detecting an internal pressure in the jig 10 are prepared. The jig 10 is held such that droplets attached on the surface of a substrate 5 when viewed from the direction perpendicular to the surface of the substrate 5 are surrounded in the opening. While the gas jetted from the opening is blown onto the surface of the substrate 5, the position of the jig 10 along the direction perpendicular to the surface of the substrate 5 is adjusted so that a differential pressure between the internal pressure and a specific pressure may be minimized. The jig 10 is held such that droplets attached on the surface of the substrate 5 when viewed from the direction perpendicular to the surface of the substrate 5 are surrounded in the opening. While the gas jetted from the opening is blown onto the surface of the substrate, the jig 10 is relatively moved along the surface of the substrate. <P>COPYRIGHT: (C)2012,JPO&INPIT |
