| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a film thickness measuring method and device capable of highly accurately measuring a film thickness. <P>SOLUTION: The film thickness measuring method for estimating a film thickness by signal-processing spectrum information includes: a process of executing base decomposition of the spectrum information for calibration curve preparation, obtaining a first coefficient applied to the base as a representative value of the spectrum information and obtaining a multiple regression coefficient from the first coefficient and film thickness data corresponding to the spectrum information; and a process of obtaining a second coefficient applied to the base on the basis of the spectrum information of a measurement object and the base and estimating the film thickness of the measurement object on the basis of the second coefficient and the multiple regression coefficient. <P>COPYRIGHT: (C)2012,JPO&INPIT |
