摘要 |
<p>Method for treating at least one surface of a part made of a bulk polymer into which multi-energy ions X+ and X2+ are implanted simultaneously, where X is the atomic symbol chosen from the list consisting of helium (He), nitrogen (N), oxygen(O), neon (Ne), argon (Ar), krypton (Kr), and xenon(Xe) and in which the RX ratio, where RX = X+/X2+ with X+ and X2+ being expressed in atomic percentages, is less than or equal to 100, for example less than 20. As a result of the very large reductions in the surface resistivity of the parts thus treated, antistatic properties or even electrostatic charge dissipation properties appear. As an example, the X+ and X2+ ions are supplied by an ECR source.</p> |