| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive siloxane composition which can be developed with a dilute alkali developer and can obtain a cured film having high transparency after heat curing. <P>SOLUTION: The photosensitive siloxane composition comprises: (a) a polysiloxane which is a copolymer obtained by hydrolyzing and condensing a compound represented by the formula (1): R<SP>1</SP><SB>x</SB>Si(OR<SP>2</SP>)<SB>4-x</SB>; (b) a quinonediazide compound; and (c) a solvent, wherein at least one of R<SP>1</SP>represents an alkyl group or oxyalkyl group substituted by an oxetanyl group or succinic acid anhydride group, the remaining R<SP>1</SP>is represented by hydrogen, a 1-10C alkyl group, 2-10C alkenyl group or a 6-15C aryl group, a plurality of symbols R<SP>1</SP>may be the same or different; R<SP>2</SP>represents hydrogen, a 1-6C alkyl group, a 1-6C acyl group or a 6-15C aryl group, a plurality of symbols R<SP>2</SP>may be the same or different; and x represents an integer of 1-3. <P>COPYRIGHT: (C)2008,JPO&INPIT |
