ILLUMINATION SYSTEM FOR USE IN A STEREOLITHOGRAPHY APPARATUS

摘要

The invention concerns an illumination system (30) for use in a stereolithography apparatus (1), comprising a planar support supporting a twodimensional array (32) of individually controllable wide-angle light-emitting diodes (LEDs) (34) comprising light emitting surfaces; and a multilens projector array (40, 42) arranged relative to the array, and adapted to project the light-emitting surfaces of the LEDs onto a work area (16). The multilens projector array is arranged to project light from the LED array having a light emitting edge area focus error which is smaller than or equal to a light emitting central area focus error.