发明名称 self aligned field effect transistor structure
摘要 Provided is a self aligned field effect transistor structure. The self aligned field effect transistor structure includes: an active region pattern on a substrate; a first gate electrode and a second gate electrode facing each other with the active region pattern therebetween; and a source electrode and a drain electrode connected to the active region pattern and disposed to be symmetric with respect to a line connecting the first and second gate electrodes, wherein the first and second gate electrodes and the source and drain electrodes are disposed on the same plane of the substrate.
申请公布号 KR101104248(B1) 申请公布日期 2012.01.11
申请号 KR20080132235 申请日期 2008.12.23
申请人 发明人
分类号 H01L21/8238;B82Y40/00;H01L21/336 主分类号 H01L21/8238
代理机构 代理人
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