Method for manufacturing a stationary structure defining a space containing a mobile element, in particular of a MEMS

摘要

The method involves determining thickness (E2) based on a vertical dimension associated to an element e.g. stop (32). The element is formed on a silicon substrate (21). Thermal oxidation of the substrate is performed on its bare portion to form a thermal oxide layer. The layer is etched to define a cavity and the element in etched and non-etched portions (24, 25). The thermal oxidation of the substrate is performed to form a silicon oxide layer on the bared portion so as to obtain the element with the dimension. An independent claim is also included for a method of manufacturing a micro electromechanical system.