PURPOSE: A wafer cleaning apparatus is provided to use nano micro bubbles in a wafer cleaning process, thereby improving cleansing power of the wafer cleaning process. CONSTITUTION: A cleaning bath(10) accepts a cleaning solution for cleaning a silicon wafer(70). A beam jig(20) fixes a plurality of wafers in which a silicon brick is cut in a slice shape. A plate(30) fixes the upper part of a plurality of wafers by being arranged in the lower part of the beam jig. A bubble spraying part(50,60) sprays nano micro bubbles of a bubble shape between each cut surface of the wafers. The diameter of the nano micro bubble is smaller than the distance between the cut surfaces arranged in the wafers.
