| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive composition capable of obtaining a good pattern without involving the problem of inferior compatibility of an acid generator with a polymer having an acid-dissociable group as a base of a photoresist. <P>SOLUTION: The photosensitive composition is a solution prepared by dissolving, in an organic solvent, a photosensitive polyhydric phenol derivative obtained by introducing an organic group represented by formula (1) into a polyhydric phenol which is not a polymer, wherein R<SP>1</SP>is a linear or branched 2-9C divalent organic group; R<SP>2</SP>-R<SP>5</SP>are each independently a hydrogen atom or a linear or branched 1-3C organic group; R<SP>6</SP>and R<SP>7</SP>are each independently an organic group, R<SP>6</SP>and R<SP>7</SP>together may form a divalent organic group; and X<SP>-</SP>represents an anion. <P>COPYRIGHT: (C)2008,JPO&INPIT |
