发明名称 |
DIAMOND TOOL HAVING STRONG CORROSION- RESISTANCE FOR CMP |
摘要 |
PURPOSE: A diamond tool for chemical mechanical polishing with strong corrosion-resistance is provided to effectively prevent a bonding layer from becoming corroded due to corrosive slurry. CONSTITUTION: A diamond tool for chemical mechanical polishing with strong corrosion-resistance comprises first, second, and third coating layers. The first coating layer is plated with a nickel alloy and is formed on a nickel bonding layer. The second coating layer is plated with a palladium alloy and is formed on the first coating layer. The third coating layer is plated with chrome and is formed on the second coating layer.
|
申请公布号 |
KR20120003197(A) |
申请公布日期 |
2012.01.10 |
申请号 |
KR20100063926 |
申请日期 |
2010.07.02 |
申请人 |
EHWA DIAMOND IND. CO., LTD. |
发明人 |
YOON, SO YOUNG;OH, JEONG HOON |
分类号 |
B24D3/10;B24B37/00;C25D5/10;C25D15/02 |
主分类号 |
B24D3/10 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|