发明名称 DIAMOND TOOL HAVING STRONG CORROSION- RESISTANCE FOR CMP
摘要 PURPOSE: A diamond tool for chemical mechanical polishing with strong corrosion-resistance is provided to effectively prevent a bonding layer from becoming corroded due to corrosive slurry. CONSTITUTION: A diamond tool for chemical mechanical polishing with strong corrosion-resistance comprises first, second, and third coating layers. The first coating layer is plated with a nickel alloy and is formed on a nickel bonding layer. The second coating layer is plated with a palladium alloy and is formed on the first coating layer. The third coating layer is plated with chrome and is formed on the second coating layer.
申请公布号 KR20120003197(A) 申请公布日期 2012.01.10
申请号 KR20100063926 申请日期 2010.07.02
申请人 EHWA DIAMOND IND. CO., LTD. 发明人 YOON, SO YOUNG;OH, JEONG HOON
分类号 B24D3/10;B24B37/00;C25D5/10;C25D15/02 主分类号 B24D3/10
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