MICROWAVE PLASMA PROCESSING APPARATUS

摘要

PURPOSE: A microwave plasma processing apparatus is provided to maintain the insulating film material of a wafer which is processed at the plasma environment with a high level by obtaining stable plasma. CONSTITUTION: An antenna(30) comprises a plurality of slots(31) having various shapes. A microwave is emitted to inside of a chamber through a plurality of slots which is formed in the antenna. The antenna is touched to a top plate by a bolt. An elongated groove(33) is formed according to the outer circumference of the antenna. A protrusion(61) which is formed according to the outer circumference of an antenna support ring(60) is combined in the elongated groove. A coupling hole(63) is formed in the protrusion. The bolt is inserted through the coupling hole.